| 摘要 |
<p>Effects by mask-specific characteristics are minimized and an accuracy with which to measure a mark position is improved. A mask mark RM1 is positioned within an observation visual field in an observation system, any one of a plurality of reference marks FMa, FMb is selectively positioned within an observation visual field based on characteristics with respect to a lighting beam of the mask mark RM1, and position information on the mask mark RM1 relative to a reference mark WFM1 is determined based on the observation results.</p> |
