发明名称 Semiconductor device manufacturing method, electronic parts mounting method and heating/melting process equipment
摘要 There is provided a semiconductor device manufacturing method which comprising the steps of forming solder bumps on an underlying metal film of a semiconductor device, and placing the semiconductor device and the solder layer in a reduced pressure atmosphere containing a formic acid to heat the solder bumps. Accordingly, the solder bumps can be formed without the use of flux not to generate voids in the solder layer, and also the cleaning required after the solder bumps are formed can be omitted.
申请公布号 US2002076909(A1) 申请公布日期 2002.06.20
申请号 US20010013506 申请日期 2001.12.13
申请人 FUJITSU LIMITED 发明人 MATSUKI HIROHISA;MATSUI HIROYUKI
分类号 H05K3/34;B23K35/26;B23K35/36;B23K35/38;H01L21/60;H01L23/485;H05K13/00;(IPC1-7):F27D5/00;F27D13/00;H01L21/44 主分类号 H05K3/34
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