| 摘要 |
A stage device includes a reaction-force-discharging structure in which a stationary member of a driving mechanism configured with a linear motor and the like disposed in a wafer chamber is connected to an external frame while maintaining the wafer chamber in a hermetic state. When a wafer stage is driven by the linear motor, a reaction force generated by driving the stage is applied to the stationary member. The reaction force is discharged to, e.g., a floor by the reaction-force-discharging structure via an external frame. For example, when the wafer chamber is set to a predetermined atmosphere of gas (including air from which organic substances and the like have been removed), the reaction force caused by driving the wafer stage can be discharged to the outside while maintaining the predetermined atmosphere. In an exposure apparatus using the stage device, accurate exposure is possible by reducing effects of vibration to the greatest extent possible.
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