发明名称 |
SEMICONDUCTOR MANUFACTURING APPARATUS |
摘要 |
A semiconductor manufacturing apparatus in this embodiment includes a reactor, a pump, an exhaust pipe and a mesh member. The reactor houses a semiconductor substrate to treat the semiconductor substrate. The pump exhausts a gas inside the reactor. The exhaust pipe connects between the reactor and the pump. The mesh member is located at a flow inlet of the pump for the gas or in the exhaust pipe and has a main plane having a plurality of meshes arranged thereon. The mesh member has a protrusion and/or protruding shape projecting upstream of the gas. |
申请公布号 |
US2016258058(A1) |
申请公布日期 |
2016.09.08 |
申请号 |
US201514847487 |
申请日期 |
2015.09.08 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
Nakahara Koji;Matsuo Kazuhiro |
分类号 |
C23C16/44 |
主分类号 |
C23C16/44 |
代理机构 |
|
代理人 |
|
主权项 |
1. A semiconductor manufacturing apparatus comprising:
a reactor that houses a semiconductor substrate to treat the semiconductor substrate; a pump that exhausts a gas inside the reactor; an exhaust pipe that connects between the reactor and the pump; and a mesh member that is located at a flow inlet of the pump for the gas or in the exhaust pipe and has a main plane having a plurality of meshes arranged thereon, the mesh member having a protrusion and/or protruding shape projecting upstream of the gas. |
地址 |
Minato-ku JP |