发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 A semiconductor manufacturing apparatus in this embodiment includes a reactor, a pump, an exhaust pipe and a mesh member. The reactor houses a semiconductor substrate to treat the semiconductor substrate. The pump exhausts a gas inside the reactor. The exhaust pipe connects between the reactor and the pump. The mesh member is located at a flow inlet of the pump for the gas or in the exhaust pipe and has a main plane having a plurality of meshes arranged thereon. The mesh member has a protrusion and/or protruding shape projecting upstream of the gas.
申请公布号 US2016258058(A1) 申请公布日期 2016.09.08
申请号 US201514847487 申请日期 2015.09.08
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 Nakahara Koji;Matsuo Kazuhiro
分类号 C23C16/44 主分类号 C23C16/44
代理机构 代理人
主权项 1. A semiconductor manufacturing apparatus comprising: a reactor that houses a semiconductor substrate to treat the semiconductor substrate; a pump that exhausts a gas inside the reactor; an exhaust pipe that connects between the reactor and the pump; and a mesh member that is located at a flow inlet of the pump for the gas or in the exhaust pipe and has a main plane having a plurality of meshes arranged thereon, the mesh member having a protrusion and/or protruding shape projecting upstream of the gas.
地址 Minato-ku JP