| 摘要 |
<p>A composition for use in texturing includes (i) microparticles or powder formed of at least one species selected from the group consisting of diamond, CBN, alumina and silicon carbide; (ii) at least one species selected from the group consisting of C2-C5 polyhydric alcohols, polycondensed products of the alcohols and alkylene glycol monoalkyl ethers represented by formula R1O(CnH2nO)mH (wherein R1 represents a C1-C4 linear or branched alkyl group, m is an integer of 1 to 3 and n is 2 or 3); and (iii) a C10-C22 fatty acid. When polishing a substrate using the composition, it is possible to form minute texturing lines, remove 'polish lines' and 'polish scratches' and minimize the mean surface roughness (Ra) of the undercoat layer of the substrate after texturing.</p> |
