发明名称 SURFACE-ACTIVE PHOTOINITIATORS
摘要 <p>A process for the production of coatings having scratch-resistant durable surfaces, in which there is used a photocurable formulation comprising a surface-active photoinitiator, concentrated at the surface of the formulation, of formula (Ia) or (Ib), wherein R and R3 are, for example, a radical of formula (II); R1 is, for example, hydrogen, A1-X1- or a radical of formula (II); R2 is, for example, unsubstituted or substituted C1-C12alkyl or A2-X2-; R4 is, for example, hydrogen or A4-X4-; R5 is, for example, hydrogen or A5-X5- or is a radical of formula (II); R6, R7, R8, R9 and R10 are each independently of the others, for example, hydrogen, A-X-, A3-X3- or C1-C12alkyl; A, A1, A2, A3, A4 and A5 are each independently of the others, for example, a surface-active radical of formula (III); n is a number from 1 to 1000, m is a number from 0 to 100; p is a number from 0 to 10 000; R18, R19, R20, R21, G1 and G2 are, for example, C1-C18alkyl; and X, X1, X2, X3, X4 and X5 are, for example, a single bond.</p>
申请公布号 WO2002048203(A1) 申请公布日期 2002.06.20
申请号 EP2001014355 申请日期 2001.12.06
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