发明名称 |
Method for forming thick film pattern and photosensitive paste used therefor |
摘要 |
A method for forming a thick film pattern is provided which can easily perform pattern formation even when a photosensitive paste containing a powdered conductor at a high content and having a low optical transmittance is used and which can form a thick film pattern having a rectangular cross-section and superior high-frequency transmission characteristics. In addition, a photosensitive paste used therefor is also provided. The thick film pattern having a predetermined shape can be formed by the steps of determining the photocurable depth d of a photosensitive paste; coating with the photosensitive paste in consideration of the photocurable depth d so as to form a photosensitive paste film having a predetermined thickness t; exposing the photosensitive paste film; and developing the exposed photosensitive paste film. Preferably, the coating with the photosensitive paste is performed so that the relationship between the photocurable depth d of the photosensitive paste and the thickness t of the photosensitive paste film satisfies the equation t<=d.
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申请公布号 |
US2002076657(A1) |
申请公布日期 |
2002.06.20 |
申请号 |
US20010897305 |
申请日期 |
2001.07.02 |
申请人 |
MURATA MANUFACTURING CO., LTD. |
发明人 |
TOWATA SHUICHI |
分类号 |
B32B27/30;G03F7/004;G03F7/027;G03F7/16;G03F7/26;G03F7/38;H05K1/09;H05K3/02;(IPC1-7):G03F7/00;B32B9/00 |
主分类号 |
B32B27/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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