SEMICONDUCTOR DEVICE LAYOUT

摘要

A method of manufacturing a semiconductor device having an n by m array of cells (32) is described, where n and m are positive integers with n at least two. Individual cells (32) have perimeter regions (34) surrounding the cells, the perimeter regions between adjacent cells being common to the adjacent cells. The method includes the steps of determining the required width or widths of the perimeter regions and calculating the optimal aspect ratio of each cell to substantially minimize the total area of an n by m array of cells subject to the determined width or widths of the perimeter regions. Then, a semiconductor device having an n by m array of active having an aspect ratio substantially in accordance with the calculated ratio is made. The invention has application to a number of types of structure, including a double diode structure.