发明名称 |
MANUFACTURE OF SILICA WAVEGUIDES WITH MINIMAL ABSORPTION |
摘要 |
An improved high temperature chemical treatment of deposited silica films wherein they are subjected to a reactive ambient comprising hydrogen and oxygen atoms. This method results in better elimination of residual undesirable oscillators so as to provide improved optical quality silica waveguides with reduced optical absorption.
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申请公布号 |
WO0248429(A1) |
申请公布日期 |
2002.06.20 |
申请号 |
WO2001CA01753 |
申请日期 |
2001.12.06 |
申请人 |
ZARLINK SEMICONDUCTOR INC. |
发明人 |
OUELLET, LUC;GRONDIN, MANUEL |
分类号 |
C23C16/40;C23C16/56;G02B6/12;G02B6/132;(IPC1-7):C23C16/56 |
主分类号 |
C23C16/40 |
代理机构 |
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主权项 |
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地址 |
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