RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX

摘要

A radiation-sensitive composition changing in refractive index which comprises (A) a decomposable compound, (B) a nondecomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation-sensitive decomposer, and (D) a stabilizer. When the composition is irradiated with a radiation through a pattern mask, the ingredients (C) and (A) in the irradiated areas decompose to cause a difference in refractive index between the irradiated areas and the unirradiated areas. Thus, a pattern having different refractive indexes is formed.