发明名称 SURFACE-ACTIVE PHOTOINITIATORS
摘要 <p>A process for the production of coatings having scratch-resistant durable surfaces, in which there are used photocurable formulations comprising a surface-active photoinitiator, concentrated at the surface of the formulation, of formula (Ia), (Ib), (Ic) or (Id), wherein R and R1 are, for example, each independently of the other a radical of formula (II); R2, R3, R4, R5, R6, R7, R8 and R9 are each independently of the others, for example, hydrogen; A-X, A1-X1-; unsubstituted or substituted C1-C12alkyl or phenyl; with the proviso that in formulae (Ia) and (Ib) at least one substituent A-X, A1-X1- is present in at least one of the radicals R and R1; and with the proviso that in formulae (Ic) and (Id) at least one of the radicals ); R2, R3, R4, R5, R6, R7, R8 and R9 is A-X, A1-X1-; A and A1 are each independently of the other a surface-active radical of formula (III) or A0; n is, for example, a number from 1 to 1000 m is a number from 0 to 100; p is a number from 0 to 10 000; A0 is, for example, C6-C30alkyl; G1 and G2 are, for example, C1-C18alkyl; R18, R19, R20, R22, R21, R23, R24, R25, R26 and R27 are, for example, C1-C18alkyl; and X and X1 are, for example, a single bond.</p>
申请公布号 WO2002048204(A1) 申请公布日期 2002.06.20
申请号 EP2001014357 申请日期 2001.12.06
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