WAFER ALIGN MARK OF SEMICONDUCTOR DEVICE AND WAFER ALIGN METHOD USING THE SAME

摘要

PURPOSE: A wafer align mark of a semiconductor device is provided to inspect position alignment of a wafer, by maximizing a scattering effect of light caused by fine patterns on a scribe line region formed by a sub pattern unit of the wafer align mark. CONSTITUTION: A shielding unit(20) composed of several aligned rectangular lattices is formed on a quartz substrate. The sub pattern unit(30) maximizes a scattering effect of light, simultaneously formed together with the shielding unit and having a predetermined fine pattern. The sub pattern unit includes the shielding unit, separated from the shielding unit by a predetermined interval in all directions.