发明名称 METHOD FOR FORMING A THIN FILM USING A GAS
摘要 A starting gas feeding apparatus for forming a gaseous starting material from a liquid starting material and feeding the gaseous starting material into a reaction chamber of a CVD apparatus, comprises; a container that holds the liquid starting material, pressure reducing means for reducing the pressure inside the container, and heating means for heating the liquid starting material held in the container; the liquid starting material being boiled.
申请公布号 US2002076489(A1) 申请公布日期 2002.06.20
申请号 US19990433565 申请日期 1999.11.04
申请人 HAYAKAWA YUKIHIRO;KAWASUMI YASUSHI;MAKINO KENJI;KATAOKA YUZO 发明人 HAYAKAWA YUKIHIRO;KAWASUMI YASUSHI;MAKINO KENJI;KATAOKA YUZO
分类号 C23C16/20;C23C16/44;C23C16/448;C23C16/452;C23C16/455;(IPC1-7):C23C16/00 主分类号 C23C16/20
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