发明名称 NEAR CRITICAL AND SUPERCRITICAL OZONE SUBSTRATE TREATMENT AND APPARATUS FOR SAME
摘要 Disclosed is a method and apparatus for treating a substrate with a reaction solvent formed of supercritical ozone in a feed phase. The feed phase can be aqueous, e.g., formed of heated, deionized water, nonaqueous, e.g., formed of a dense fluid, such as supercritical carbon dioxide, liquid carbon dioxide, supercritical nitrogen or combinations the dense fluids or the feed phase can be a mixture of aqueous and nonaqueous phases.
申请公布号 WO0211191(A3) 申请公布日期 2002.06.20
申请号 WO2001US24185 申请日期 2001.07.31
申请人 THE DEFLEX LLC;JACKSON, DAVID, P. 发明人 JACKSON, DAVID, P.
分类号 B81C1/00;G03F7/42;H01L21/00;H01L21/306 主分类号 B81C1/00
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