发明名称 |
Novel onium salts, photoacid generators, resist compositions, and patterning process |
摘要 |
Onium salts of arylsulfonyloxynaphthalenesulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, improved focal latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.
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申请公布号 |
US2002076643(A1) |
申请公布日期 |
2002.06.20 |
申请号 |
US20010983155 |
申请日期 |
2001.10.23 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
OHSAWA YOUICHI;WATANABE JUN;NAGATA TAKESHI;HATAKEYAMA JUN |
分类号 |
G03F7/027;C07C25/02;C07C309/35;C07C309/74;C07C381/12;C08K5/09;C08K5/16;C08K5/42;C08L25/18;C08L33/02;C09K3/00;G03F7/004;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):G03F7/038;G03F7/20;G03F7/30;G03F7/38;G03F7/40;C0739/35 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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地址 |
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