发明名称 Method of manufacturing a semiconductor wafer and alignment marks for use therein
摘要 A semiconductor wafer is aligned with the use of alignment marks which have a slit pattern with a plurality of slits 21 arranged upon the wafer 20 and a dot pattern with a plurality of dots 22,23 arranged along the length of the slits at the outer regions of the two end slits.
申请公布号 GB2370129(A) 申请公布日期 2002.06.19
申请号 GB20010027030 申请日期 2001.11.09
申请人 * NEC CORPORATION 发明人 TOSHIAKI * KOSHITAKA
分类号 G03F1/08;G01D21/00;G03F1/42;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03F9/00 主分类号 G03F1/08
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