Electron beam treatment device

摘要

An electron beam treatment device is provided for treating a substance (W) located in a processing chamber (2) which includes electron beam tubes (1) arranged such that electron beam windows (15) project into the processing chamber (2). The electron beam tubes (1) are arranged such that an absorption dose of the entire treatment area of the substance (W) to be treated has a given distribution. The electron beams emitted by the electron beam tubes (1) are advantageously superimposed so that the absorption dose of the entire treatment area of the substance (W) to be treated is shifted into a given distribution condition, and in which thus the entire treatment area of the substance (W) to be treated can be treated as a whole without moving the substance (W) to be treated.