CHAMBER SYSTEM HAVING CLEANING FUNCTION AND METHOD OF CLEANING SPECIMENS USING THE SAME

摘要

PURPOSE: A chamber system having a cleaning function is provided to prevent a contamination of a main chamber due to a contaminated ingot by previously removing the contamination of the ingot before loading the ingot into the main chamber. CONSTITUTION: A chamber system having a cleaning function comprises a main chamber(100), a loading chamber(200) connected or separated with the main chamber(100) through a valve(350) for standing-by an ingot(450) supplied to the main chamber(100), an ingot holder(410) supplying the ingot(450) to the loading chamber(200), and a plasma generator installed in the loading chamber(200) for supplying a plasma so as to clean the ingot(450). The plasma generator further includes an RF coil(550) installed around the ingot(450) mounted portion of the loading chamber(200), a source supplying pipe(510) for supplying a plasma source.