APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE WITH CONVEYER BELT

摘要

PURPOSE: An apparatus for fabricating a semiconductor device with a conveyer belt is provided to remove particles from a substrate and reduce a cleaning period of a muffle by cleaning effectively a conveyer belt. CONSTITUTION: An APCVD(Atmosphere Pressure Chemical Vapor Deposition) apparatus is formed with a muffle(10), a process stage(20), and a conveyer belt(40). The process stage(20) includes an injector(22). The injector(22) is used for supplying a gas from a gas supply system(50) to a substrate(30). The conveyer belt(40) is used for transferring the substrate(30). An APCVD chamber region(28) is formed by the process stage(20). A plurality of curtain(24) is installed within the muffle(10) in order to surround both sides of the injector(22). A region of the process stage(20) is divided by the curtain(24). A cleaning station(100) is used for cleaning the conveyer belt(40). A rinse station(200) is used for rinsing the conveyer belt(40). A dry station(300) is used for drying the conveyer belt(40).