发明名称 Method for producing vacuum processing chambers
摘要 A structure and method are present where a sidewall of a load lock chamber is formed by extrusion, to produce a reproducible tubular structure to form the walls of a vacuum chamber with greatly improved vacuum performance. The use of an extruded structure reduces the dimensional variability, increases the uniformity of a surface finish, and provides uniform top and bottom sealing arrangements, which allow full and easy access to the inside of the sidewalls for cleaning. In another arrangement heat transfer fluid passages can be formed in the wall of the chamber simultaneously as the wall of the chamber is extruded. Heating or cooling liquid can then be circulated through the passages in the wall of the chamber to heat the walls of the chamber as sometimes required to prevent condensation on the inside of the chamber walls, or provide cooling as is required for cool down of a wafer, after processing at an elevated temperature.
申请公布号 US6405423(B1) 申请公布日期 2002.06.18
申请号 US20000711192 申请日期 2000.11.13
申请人 APPLIED MATERIALS, INC. 发明人 DONDE ARIK
分类号 B29C47/00;H01J37/16;H01L21/00;(IPC1-7):B23P11/00 主分类号 B29C47/00
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