发明名称 Laser lithography quality alarm system
摘要 An electric discharge laser with an associated programmable controller which (1) will permit an operator to specify beam quality parameters based on historical data (2) will monitor those parameters and (3) will provide a notification signal to the operator informing him when the beam quality is adequate for integrated circuit fabrication. The controller is programmed to indicate an out-of-control condition when one or more quality parameters exhibit certain specified non-random behavior such as two out of three quality measurements deviating by more than 4 standard deviations and/or three out of four quality measurements deviating by more three standard deviations. In a preferred embodiment the program is designed to detect poor quality by looking for these "runs" of bad quantity data and to produce false indication of system out of control, on the average, no more than once each two months.
申请公布号 US6408260(B1) 申请公布日期 2002.06.18
申请号 US20000505233 申请日期 2000.02.16
申请人 CYMER, INC. 发明人 WATTS MICHAEL P. C.;WATSON TOM A.
分类号 H01L21/027;G03F7/20;G05B19/00;G07C3/00;H01S3/00;H01S3/225;(IPC1-7):G06F15/00 主分类号 H01L21/027
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