发明名称 |
Unsupported chemical mechanical polishing belt |
摘要 |
A belt for polishing a workpiece such as a semiconductor wafer in a chemical mechanical polishing system includes a polymeric layer forming an endless loop and having a polishing surface on one side of the endless loop. The belt is manufactured by molding a polymeric material such as urethane in a cylindrical mold. The belt is thus made from a single layer, reducing weight, size, cost and maintenance requirements.
|
申请公布号 |
US6406363(B1) |
申请公布日期 |
2002.06.18 |
申请号 |
US19990386741 |
申请日期 |
1999.08.31 |
申请人 |
LAM RESEARCH CORPORATION;PERIPHERAL PRODUCTS, INC. |
发明人 |
XU CANGSHAN;LOMBARDO BRIAN S. |
分类号 |
B24B21/00;B24B37/00;B24B37/04;B24D7/12;B24D11/00;B24D18/00;H01L21/304;(IPC1-7):B24B21/00 |
主分类号 |
B24B21/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|