| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide apparatuses for safely and efficiently detoxifying harmful gases emitted from, e.g. semiconductor production apparatuses and liquid crystal production apparatuses. SOLUTION: One of the apparatuses is provided with a water-pool-type intoxicating means and a bubbling- or filler-type detoxifying means contiguous thereto. The other is provided with a suction part communicating with the upper part of a liquid tank; a flow-path-forming guide provided in the tank; a punched plate provided in the upper part of the tank; and a gas suction means that that passes harmful gases through the suction part, the liquid tank, and the punched plate in the given order.</p> |
