发明名称 PHOTOACID PRODUCING AGENT AND VISIBLE RAY PHOTOSENSITIVE RESIN COMPOSITION BY USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a visible ray photosensitive resin composition having sufficient sensitivity in the visible ray region, especially for the second harmonic waves of a He-Cd laser, Ar laser and YAG laser and having superior storage stability. SOLUTION: In the visible ray photosensitive resin composition containing a visible ray photosensitive resin and a photoacid producing agent, the composition contains a dipyrromethene compound expressed by general formula (1) as the photoacid producing agent.
申请公布号 JP2002169275(A) 申请公布日期 2002.06.14
申请号 JP20000368564 申请日期 2000.12.04
申请人 MITSUI CHEMICALS INC 发明人 NAKAGAWA SHINICHI;TSUKAHARA TAKASHI;NISHIMOTO TAIZO;INOUE SHINOBU;OGISO AKIRA;MISAWA TSUTAYOSHI
分类号 G03F7/004;C07F5/02;C08K5/55;C08L101/00;G03F7/039 主分类号 G03F7/004
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