发明名称 |
PHOTOACID PRODUCING AGENT AND VISIBLE RAY PHOTOSENSITIVE RESIN COMPOSITION BY USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a visible ray photosensitive resin composition having sufficient sensitivity in the visible ray region, especially for the second harmonic waves of a He-Cd laser, Ar laser and YAG laser and having superior storage stability. SOLUTION: In the visible ray photosensitive resin composition containing a visible ray photosensitive resin and a photoacid producing agent, the composition contains a dipyrromethene compound expressed by general formula (1) as the photoacid producing agent. |
申请公布号 |
JP2002169275(A) |
申请公布日期 |
2002.06.14 |
申请号 |
JP20000368564 |
申请日期 |
2000.12.04 |
申请人 |
MITSUI CHEMICALS INC |
发明人 |
NAKAGAWA SHINICHI;TSUKAHARA TAKASHI;NISHIMOTO TAIZO;INOUE SHINOBU;OGISO AKIRA;MISAWA TSUTAYOSHI |
分类号 |
G03F7/004;C07F5/02;C08K5/55;C08L101/00;G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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