METHOD OF MAKING PHOTOMASK AND PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a photomask which does not flaw an exposing machine and does not degrade exposure accuracy and productivity by the damage, etc., of a glass when the photomask using a glass dry plate is used. SOLUTION: The photomask is constituted by forming patterns for exposure on one surface of a glass base and laminating a tacky adhesive layer, a transparent film and a transmittance improving layer in this order on the other surface.