| 摘要 |
PROBLEM TO BE SOLVED: To provide a reflection type liquid crystal display device having superior display functions, even if a PR (photolithography) process is eliminated and a method for manufacturing the device. SOLUTION: The method for manufacturing a reflection type liquid crystal display device includes (a) a process of forming source/drain lines by using a first mask, (b) a process of forming a thin-film transistor region and a gate line by using a second mask, (c) a process of forming an openings for a transistor in a passivation film by using a third mask, (d) a process of forming a rugged surface and an opening for the transistor in an interlayer insulating film by a halftone exposure method by using a fourth mask, and (e) a process of forming a reflection electrode, which electrically connects with the source line through each opening for the transistor in the passivation film and in the interlayer insulating film by using a fifth mask. |
