PHOTOMASK BLANK AND METHOD OF MANUFACTURING PHOTOMASK BLANK

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a photomask blank which lessens the warpage of a substrate by film stress (relieves the film stress) and improves the density and denseness of the films. SOLUTION: The method of manufacturing the photomask blank by forming the light shielding films or light translucent films on a transparent substrate comprises forming the light shielding films or light translucent films by depositing the light shielding films or light translucent films by a sputtering method on the substrate 6 and simultaneously irradiating the film materials under deposition on the substrate 6 with the ions formed by an ion former (hereafter an ion source 11) separately included in a deposition chamber.