发明名称 PHOTOSENSITIVE RESIN COMPOSITION, USE THEREOF, LACTONE RING-CONTAINING POLYMER, AND PRODUCTION THEREOF
摘要 PURPOSE: A photosensitive resin composition including a polymer containing a lactone ring as an essential component and a process of preparing the polymer containing a lactone ring are provided. The photosensitive resin composition can form uniform coating films with higher coating film strength without causing surface contamination, can decrease of evenness of coating films, decrease of film thickness, and coloring by decomposition in heat treatment of subsequent steps, and has good sensitivity of exposure. CONSTITUTION: The photosensitive resin composition comprises a lactone ring-containing polymer obtained by polymerization of comonomers and lactonization, wherein the comonomers include a 2-(hydroxyalkyl)acrylate ester and a monomer component containing an acidic group. The lactone ring-containing polymer is obtained by almost quantitatively lactonization of a 2-(hydroxyalkyl)acrylate ester structural unit.
申请公布号 KR20020044087(A) 申请公布日期 2002.06.14
申请号 KR20010076133 申请日期 2001.12.04
申请人 NIPPON SHOKUBAI CO., LTD. 发明人 ASANO HIDEO;KANEKO TOMOMASA;KATAOKA SHINGO;UEDA KENICHI;YAMAGUCHI MINORU;YOSHIDA MASATOSHI
分类号 C08F8/16;C08F220/14;C08F220/28;G02F1/1335;G03F7/00;G03F7/033;G03F7/038;(IPC1-7):G03F7/027 主分类号 C08F8/16
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