发明名称 PLASMA PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To enable a more even plasma processing than conventional plasma processing. SOLUTION: Monopole antennas 30 mounted oppositely on the surface of a mounting rest, which is located in a processing vessel, are consisted of a plurality of monopole antennas 30A-30D. The electromagnetic of the monopole antennas 30 are composed in order to form a circular polarization.
申请公布号 JP2002170816(A) 申请公布日期 2002.06.14
申请号 JP20000368121 申请日期 2000.12.04
申请人 TOKYO ELECTRON LTD 发明人 ISHII NOBUO
分类号 H05H1/46;H01L21/205;H01L21/302;H01L21/3065 主分类号 H05H1/46
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