| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a metal membrane which is optically uniform, and which will not have corrosion or change of characteristics. SOLUTION: On the surface and the back of a silicon monocrystal substrate 1, an SiN film 2 as a support body is formed by LP-CVD or the like (a). On the back side of it, resist 3 is applied, and it is removed by a photolithography process except for a part for forming a metal thin film (b). The SiN film 2 is removed by dry etching by SF6 gas, and the resist is then removed (c). Next, the silicon monocrystal substrate 1 is removed by dry etching using fluorine- based active seeds from the back side to produce SiN as a support layer (d). After that, metal 4 of Al, Ti, or the like is formed on the surface side of the SiN film 2 by deposition, sputtering, or the like (e). Finally, the SiN film 2 is removed by dry etching by SF6 gas from the back side, thereby the metal membrane 4 is completed.
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