| 发明名称 |
METHOD FOR CLEANING ETCHER PARTS |
| 摘要 |
The invention relates to a method useful in removing etch residue from etcher equipment parts. The compositions used are aqueous, acidic compositions containing fluoride and polar, organic solvents. The compositions are free of glycols and hydroxyl amine and have a low surface tension and viscosity.
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| 申请公布号 |
WO0246344(A1) |
申请公布日期 |
2002.06.13 |
| 申请号 |
WO2001US43171 |
申请日期 |
2001.12.03 |
| 申请人 |
ASHLAND INC. |
发明人 |
PETERS, DARYL, W.;ROVITO, ROBERTO, J. |
| 分类号 |
C11D7/26;C11D7/30;C11D7/32;C11D7/50;C11D11/00;C23G1/02;(IPC1-7):C11D1/835;B08B3/04;C11D3/04;C11D7/04;C11D7/08;C23G5/036;H01L21/00 |
主分类号 |
C11D7/26 |
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