发明名称 Method for improving barrier properties of refractory metals/metal nitrides with a safer alternative to silane
摘要 A barrier/liner structure (10) and method. First, a refractory metal/metal nitride layer (12) is formed over a structure (18), for example, by metal-organic CVD (MOCVD). Then, the refractory metal/metal nitride layer (12) is exposed to an organosilane, such as diethylsilane, to obtain a silicon-rich surface layer (14).
申请公布号 US2002072227(A1) 申请公布日期 2002.06.13
申请号 US20010938207 申请日期 2001.08.23
申请人 RUSSELL NOEL;FAUST RICHARD A.;YUI ROBERT E.;LU JIONG-PING 发明人 RUSSELL NOEL;FAUST RICHARD A.;YUI ROBERT E.;LU JIONG-PING
分类号 H01L21/768;(IPC1-7):H01L21/44 主分类号 H01L21/768
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