| 摘要 |
<p>The present invention relates to a system (100) for the manufacture of semiconductor devices by lithography, and in particular to an assembly (206) of mask containers (200:C1-C4) for use in such a system. The system comprises: a plurality of mask containers adapted to engage with one another such that two or more containers can be carried together as a stack; a plurality of lithography bays (110:L1-L4); a transport rail system (101) for carrying the containers between different lithography bays. Easch lithography bay has a transmitter-receiver unit (170: D1-D4) for communicating lithography data with a tracking device (205) located in each container, allowing for more efficient mask management. The transportation of the containers in stacks results in an improvement in efficiency.</p> |
