发明名称 Direct imaging polymer fluid jet orifice
摘要 A process for creating and an apparatus employing shaped orifices in a semiconductor substrate. A first layer of material is applied on the semiconductor substrate then a second layer of material is then applied upon the first layer of material. An orifice image is then transferred to the first layer of material and a fluid-well image is transferred to the second layer of material. That portion of the second layer of material where the orifice image is located is then developed along with that portion of the first layer of material where the fluid well is located to define an orifice in the substrate.
申请公布号 US2002071006(A1) 申请公布日期 2002.06.13
申请号 US20020062807 申请日期 2002.02.01
申请人 CHEN CHIEN-HAU;WENZEL DONALD E.;LIU QIN;KAWAMURA NAOTO;SEAVER RICHARD W.;WU CARL;VOOREN COLBY VAN;HESS JEFFERY S.;DAVIS COLIN C. 发明人 CHEN CHIEN-HAU;WENZEL DONALD E.;LIU QIN;KAWAMURA NAOTO;SEAVER RICHARD W.;WU CARL;VOOREN COLBY VAN;HESS JEFFERY S.;DAVIS COLIN C.
分类号 B41J2/16;(IPC1-7):B41J2/05 主分类号 B41J2/16
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