发明名称 METHOD FOR PRODUCING A THIN FILM COMPRISING INTRODUCTION OF GASEOUS SPECIES
摘要 The invention concerns a method for producing a thin film from a structure, comprising the following steps: (a) producing a stacked structure consisting of a first part designed to facilitate introduction of gaseous species and a second part, the second part including a first free surface and a second surface integral with the first part; (b) introducing gaseous species in the structure, from the first part so as to produce a cleavage zone, the thin film being thus delimited between the first surface of the second part and said cleavage zone; (c) separating the thin film from the rest of the structure at the cleavage zone.
申请公布号 WO0247156(A1) 申请公布日期 2002.06.13
申请号 WO2001FR03873 申请日期 2001.12.07
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE;ASPAR, BERNARD;BRUEL, MICHEL 发明人 ASPAR, BERNARD;BRUEL, MICHEL
分类号 H01L21/265;H01L21/02;H01L21/301;H01L21/762;H01L27/12 主分类号 H01L21/265
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