发明名称 |
METHOD FOR PRODUCING A THIN FILM COMPRISING INTRODUCTION OF GASEOUS SPECIES |
摘要 |
The invention concerns a method for producing a thin film from a structure, comprising the following steps: (a) producing a stacked structure consisting of a first part designed to facilitate introduction of gaseous species and a second part, the second part including a first free surface and a second surface integral with the first part; (b) introducing gaseous species in the structure, from the first part so as to produce a cleavage zone, the thin film being thus delimited between the first surface of the second part and said cleavage zone; (c) separating the thin film from the rest of the structure at the cleavage zone. |
申请公布号 |
WO0247156(A1) |
申请公布日期 |
2002.06.13 |
申请号 |
WO2001FR03873 |
申请日期 |
2001.12.07 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE;ASPAR, BERNARD;BRUEL, MICHEL |
发明人 |
ASPAR, BERNARD;BRUEL, MICHEL |
分类号 |
H01L21/265;H01L21/02;H01L21/301;H01L21/762;H01L27/12 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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