发明名称 |
Slide used for simultaneously removing material from both sides of semiconductor wafers between rotating plates comprises base body surface, surface of recess for receiving wafer, and surface of further recesses |
摘要 |
A slide comprises 20% of a base body surface, 35% of a surface of a recess for receiving a wafer, and 12-30% of a surface of further recesses. An Independent claim is also included for a process for simultaneously removing material from both sides of semiconductor wafers. Preferred Features: The base body is made from a planar wave-free sheet steel. The recess for receiving the wafer is lined with a plastic ring having the same thickness as the base body.
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申请公布号 |
DE10154942(A1) |
申请公布日期 |
2002.06.13 |
申请号 |
DE2001154942 |
申请日期 |
2001.11.08 |
申请人 |
WACKER SILTRONIC GESELLSCHAFT FUER HALBLEITERMATERIALIEN AG |
发明人 |
WENSKI, GUIDO;HEIER, GERHARD;STAUDHAMMER, JOHANNES |
分类号 |
B24B37/04;B24B37/08;H01L21/304;H01L21/306;(IPC1-7):H01L21/304 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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