| 发明名称 |
CERAMIC SUBSTRATE, CERAMIC HEATER, ELECTROSTATIC CHUCK AND WAFER PROBER FOR USE IN SEMICONDUCTOR PRODUCING AND INSPECTING DEVICES |
| 摘要 |
<p>The present invention provide a ceramic substrate for semiconductor manufacture and/or inspection which is conducive to decrease in alpha -rays radiated, the prevention of electrical errors, decrease in electrostatic chucking force such as heater, wafer prober, generation of particles, and circuit defects. This invention is related to a ceramic substrate for apparatuses for use in semiconductor manufacture and/or inspection wherein the level of alpha -rays radiated from the surface of the ceramic substrate is not higher than 0.250c/cm<2>.hr. <IMAGE></p> |
| 申请公布号 |
EP1213753(A1) |
申请公布日期 |
2002.06.12 |
| 申请号 |
EP20000904018 |
申请日期 |
2000.02.18 |
| 申请人 |
IBIDEN CO., LTD. |
发明人 |
ITO, YASUTAKA;HIRAMATSU, YASUJI |
| 分类号 |
C04B35/00;C04B35/581;H01L21/027;H01L21/66;H01L21/68;H01L21/683;H05B3/02;H05B3/14;H05B3/20;(IPC1-7):H01L21/68 |
主分类号 |
C04B35/00 |
| 代理机构 |
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