发明名称 PHOTOSENSITIVE RESIN COMPOSITION OF AQUEOUS EMULSION TYPE
摘要 <p>Present invention provides an aqueous emulsion type photosensitive resin composition which forms a cured film significantly superior in water and solvent resistances in comparison with the conventional aqueous emulsion type photosensitive resin compositions. This photosensitive resin composition contains (A) an emulsion of a photosensitive water-insoluble polymer, the emulsion being obtained by reacting (i) an aqueous polymer emulsion whose main ingredient is a water-insoluble polymer and which contains a polymer having a hydroxyl group with (ii) an N-alkylol(meth)acrylamide, (B) a compound having a photoreactive ethylenically unsaturated group, and (C) a photopolymerization initiator.</p>
申请公布号 EP1213327(A1) 申请公布日期 2002.06.12
申请号 EP20000935573 申请日期 2000.06.07
申请人 GOO CHEMICAL CO., LTD. 发明人 MORIGAKI, TOSHIO;MATSUMOTO, MASATAMI
分类号 C08L101/06;G03F7/027;G03F7/032;G03F7/033;G03F7/038;G03F7/12;(IPC1-7):C08L101/06 主分类号 C08L101/06
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