发明名称 |
METHOD FOR FABRICATING COPOLYMER THIN FILM USING LOW-TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION METHOD |
摘要 |
PURPOSE: A method for fabricating a copolymer thin film using a low-temperature plasma enhanced chemical vapor deposition(PECVD) method is provided to effectively improve the quality of a surface, by forming a hydrophilic layer necessary for a fog prevention treatment process. CONSTITUTION: A multilayered metal oxide coating material including a hydrophilic material or anti-reflective coating material is formed on a base material. The surface of the base material is activated by plasma generated by non-reactive gas in a vacuum atmosphere. At least one organic compound monomer has a hydrophilic group or forms the hydrophilic group by a plasma polymer reaction. Organic metal compound of at least one kind including an inorganic component is introduced as a gas phase to the inside of a reactor so that the organic metal compound and reactive gas generate plasma caused by electric discharge. An organic/inorganic functional copolymer layer is formed by the generated plasma.
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申请公布号 |
KR20020043702(A) |
申请公布日期 |
2002.06.12 |
申请号 |
KR20000072764 |
申请日期 |
2000.12.02 |
申请人 |
KANG, BYUNG KOO;WOO KWANG CHEMICAL CO., LTD. |
发明人 |
KANG, BYUNG KOO;LEE, EUN SEOK |
分类号 |
H01L21/205;(IPC1-7):H01L21/205 |
主分类号 |
H01L21/205 |
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