发明名称 METHOD FOR FABRICATING COPOLYMER THIN FILM USING LOW-TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION METHOD
摘要 PURPOSE: A method for fabricating a copolymer thin film using a low-temperature plasma enhanced chemical vapor deposition(PECVD) method is provided to effectively improve the quality of a surface, by forming a hydrophilic layer necessary for a fog prevention treatment process. CONSTITUTION: A multilayered metal oxide coating material including a hydrophilic material or anti-reflective coating material is formed on a base material. The surface of the base material is activated by plasma generated by non-reactive gas in a vacuum atmosphere. At least one organic compound monomer has a hydrophilic group or forms the hydrophilic group by a plasma polymer reaction. Organic metal compound of at least one kind including an inorganic component is introduced as a gas phase to the inside of a reactor so that the organic metal compound and reactive gas generate plasma caused by electric discharge. An organic/inorganic functional copolymer layer is formed by the generated plasma.
申请公布号 KR20020043702(A) 申请公布日期 2002.06.12
申请号 KR20000072764 申请日期 2000.12.02
申请人 KANG, BYUNG KOO;WOO KWANG CHEMICAL CO., LTD. 发明人 KANG, BYUNG KOO;LEE, EUN SEOK
分类号 H01L21/205;(IPC1-7):H01L21/205 主分类号 H01L21/205
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