发明名称 |
Lithography apparatus with filters for optimizing uniformity of an image |
摘要 |
A lithographic projection apparatus has a correction device for lithographic projection. The lithographic projection apparatus has a projection system that projects a beam of radiation onto a mask. The correction device has a filter unit placed in the path of the beam for varying the spatial intensity of the beam along at least one direction of its cross-section so that the integrated intensity of radiation of mask level is substantially uniform across the entire length or the cross-section.
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申请公布号 |
US6404499(B1) |
申请公布日期 |
2002.06.11 |
申请号 |
US19990293000 |
申请日期 |
1999.04.16 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
STOELDRAIJER JUDOCUS M. D.;TEN CATE JAN W. R.;FEY FRANCISCUS H. A. G.;SYTSMA JOOST |
分类号 |
H01L21/027;G03F7/20;G03F7/23;(IPC1-7):G01B11/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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