| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive polyimide precursor which can be treated by water development and from which good polyimide pattern is obtained and also, of which the production process can be simplified, and a phenol derivative containing an amino group which is a raw material to produce the above photosensitive polyimide precursor. SOLUTION: In this phenol derivative containing the amino group, two or more phenol compounds are linearly combined through atoms or groups, and one of hydrogen atoms in benzene rings of phenol compounds of both ends is substituted by the amino group. The photosensitive polyimide precursor comprises repeated units shown by general formula (2) (wherein, three R1 s are hydrogen atoms or the like; three R2 s each combined with benzene rings of both ends are hydrogen atoms or the like; X is -CH2- or the like; n is an integer of 0-2; R4 is an aromatic tetracarboxylic acid dianhydride residue; (n+2) of R5 s are hydrogen atoms or the like; R5 is a hydrogen atom or the like). |
