| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a polishing composition improved in dripping at an edge face compared with conventional polishing compositions in polishing a substrate used for a memory hard disk, and to provide a polishing method. SOLUTION: The polishing composition comprises ingredients: (a) water, (b) at least one compound selected from the group consisting of polyoxyethylene polyoxypropylene alkyl ethers and polyoxyethylene polyoxypropylene block copolymers, (c) at least one compound selected from the group consisting of nitric acid, nitrous acid, sulfuric acid, hydrochloric acid, molybdic acid, sulfamic acid, glycine, glyceric acid, mandelic acid, malonic acid, ascorbic acid, glutamic acid, glyoxylic acid, malic acid, glycolic acid, lactic acid, gluconic acid, succinic acid, tartaric acid, maleic acid and citric acid, and salts thereof, and (d) at least one polishing material selected from the group consisting of aluminum oxide, silicone oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and silicon carbide. The polishing method of a memory hard disk using the same is also provided.</p> |
