发明名称 Semiconductor device and method of manufacturing the same
摘要 Subcollector layers or emitter layers constituting a bipolar transistor having different thicknesses form a two-layered structure. A resistor layer is formed at the same as one of the subcollector layers or one of the emitter layers, from the same material as that of the subcollector layer or emitter layer. A resistor is formed by the resistor layer made of the same material as that of the subcollector layer or emitter layer. A resistor with a desired resistance can be integrally built into a semiconductor device without adversely affecting the characteristics of a bipolar transistor.
申请公布号 US6403436(B1) 申请公布日期 2002.06.11
申请号 US20000619337 申请日期 2000.07.19
申请人 NEC CORPORATION 发明人 TANOMURA MASAHIRO
分类号 H01L29/73;H01L21/331;H01L21/8222;H01L21/8252;H01L27/06;H01L29/205;H01L29/737;H01L29/8605;(IPC1-7):H01L21/331 主分类号 H01L29/73
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