| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus that a treatment liquid discharged from an orifice of a vessel hardly adheres to a wall plate and other parts in a mist condition and further such liquid hardly adheres or adheres to the plate again. SOLUTION: Because a chute 73 is installed to the wall plate 71 along the periphery of a rotary cup 42, a photo resist which is flown out of an orifice 58 of the rotary cup 42 can be recovered by the chute 73 without failure. Such a case that a photo resist becomes mist to be scattered around less happens than the case that, since there is no chute part 73, the photo resist flowing out of the orifice 58 of the rotary cup 42 directly hits the wall. |
