发明名称 Semiconductor light emitting device and method for manufacturing the same
摘要 At least a one conductivity type nanostructure PS layer whose thickness is controlled, and the opposite conductivity type nanostructure PS layer and a one conductivity type mesostructure PS layer arranged in contact with both these sides are comprised. Since the one conductivity type nanostructure PS layer is formed by anodizing the non-degenerate n-type crystalline silicon layer whose thickness is established in advance, the thickness which can provides a maximum luminescence efficiency can be obtained correctly. Then a semiconductor light emitting device whose luminescence efficiency is improved without increasing an unnecessary series resistance is provided. An inexpensive semiconductor light emitting device having a large light emitting area can be provided, since silicon wafer having a large diameter can be employed as the material for light emission.
申请公布号 US6403391(B1) 申请公布日期 2002.06.11
申请号 US20000481075 申请日期 2000.01.11
申请人 KOKUSAI DENSHIN DENWA KABUSHIKI-KAISHA 发明人 NISHIMURA KOHSUKE;NAGAO YASUYUKI
分类号 H01L33/34;(IPC1-7):H01L21/00 主分类号 H01L33/34
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