SPIN TREATMENT APPARATUS AND ANTI-SCATTERING CUP

摘要

PROBLEM TO BE SOLVED: To provide a spin treatment apparatus that can prevent a treatment liquid which is reflected by an anti-scattering cup from re-adhering to a substrate when the substrate is treated with the treatment liquid. SOLUTION: The apparatus is equipped with a rotary table 1 which holds a substrate 3 to rotate it, a treatment liquid nozzle 6 to supply such liquid to the substrate, and an anti-scattering cup 12 which is installed around the substrate held by the rotary table to receive and reflect the treatment liquid scattered from the end periphery of the substrate by its inner circumferential surface. The anti-scattering cup is featured that a part to receive the treatment liquid scattered from the end periphery of the substrate's inside perimeter is installed at an angle which is equal to or less than 30 degrees against the plate face of the substrate.