PLASMA PROCESSING APPARATUS

摘要

PURPOSE: To provide a plasma processing apparatus which is easy to control ion irradiation energy to a work, and plasma processing on the work is evenly performed at the time of plasma excitation by microwave. CONSTITUTION: A slot antenna plate 7 is disposed at the chamber inside 13 of a second dielectric 5 for irradiating microwave into the chamber inside 13. The antenna plate 7 comprises dielectric, and also has a slot 7a for inducing the microwave into the chamber inside 13.