发明名称 |
Alternative photoresist stripping solutions |
摘要 |
The present invention is directed toward effective photoresist stripping compositions that are less corrosive and do not cause skin irritation. One form of the present invention is a composition useful as a photoresist remover that includes an alkylene carbonate, and one or more additional components chosen from the group that includes alkyl hydrogen peroxides, hydroxyalkyl ureas, urea-hydrogen peroxides, N-substituted morpholines and alcohols. Another form of the present invention is a composition for removing photoresist from a surface that includes an N-substituted morpholine.
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申请公布号 |
US2002068244(A1) |
申请公布日期 |
2002.06.06 |
申请号 |
US20010946313 |
申请日期 |
2001.09.05 |
申请人 |
HUNTSMAN PETROCHEMICAL CORPORATION |
发明人 |
MACHAC JAMES R.;MARQUIS EDWARD T.;CRAWFORD WHEELER C. |
分类号 |
G03F7/42;(IPC1-7):G03F7/42;C11D3/00;C11D17/00 |
主分类号 |
G03F7/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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