发明名称 CATADIOPTRIC PROJECTION SYSTEM FOR 157 NM LITHOGRAPHY
摘要 <p>A photolithographic reduction projection catadioptric objective includes a first optical group G1 including an even number of at least four mirrors M1-M6; and a second at least substantially dioptric optical group G2 imageward than the first optical group G1 including a number of lenses E4-E13. The first optical group G1 provides compensative axial aberrative correction for the second optical group G2 which forms an image with a numerical aperture of at least substantially 0.65, and preferably at least 0.70 or 0.75. Six mirror examples are shown.</p>
申请公布号 WO2002044786(A2) 申请公布日期 2002.06.06
申请号 EP2001013851 申请日期 2001.11.28
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