发明名称 Polishing machine for semiconductor wafers includes two-chamber carrier system with membrane and openings in correspondence
摘要 The carrier includes a retaining ring on its lower edge. It also has a holder, and is constructed to form first- and second separate chambers. The holder carries a plane surface section with first openings connecting with the first chamber. Second openings communicate with a second chamber. A membrane encloses the surface section of the holder. The membrane is or can be, spaced from the surface. It includes a number of third openings, which correspond with the first openings. An Independent claim is included for the corresponding method.
申请公布号 DE10143938(A1) 申请公布日期 2002.06.06
申请号 DE2001143938 申请日期 2001.09.07
申请人 发明人
分类号 B24B37/00;B24B37/005;B24B37/04;B24B37/30;H01L21/304;(IPC1-7):H01L21/302 主分类号 B24B37/00
代理机构 代理人
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